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Equipment
Power supply for high impulse power magnetron sputtering
Purpose of equipment
The power supply is operational in line with a vacuum system and magnetron source (cathode). It provides short pulses (10-1000 µs) at high peak power which allows for a complete ionization of the sputtered target atoms.
Access of equipment
Responsible for equipment:
PhD Matjaž Panjan
Advance contact to the address matjaz.panjan@ijs.si.
Advance contact to the address matjaz.panjan@ijs.si.
Research projects (1) Legend
| no. | Code | Title | Period | Head | No. of publicationsNo. of publications |
|---|---|---|---|---|---|
| 1. | J2-2509 | 9/1/2020 - 2/29/2024 | 3,512 |
ARIS research and infrastructure programmes (1) Legend
| no. | Code | Title | Period | Head | No. of publicationsNo. of publications |
|---|---|---|---|---|---|
| 1. | P2-0082 | 1/1/2015 - 12/31/2021 | 5,005 |
Organisations (1)
| no. | Code | Research organisation | City | Registration number | No. of publicationsNo. of publications |
|---|---|---|---|---|---|
| 1. | 0106 | Ljubljana | 5051606000 | 95,032 |