Equipment source: ARIS

Pulsed Laser Deposition (PLD) system

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Purpose of equipment
Pulsed laser deposition is a technique for thin-film growth of inorganic materials mainly. The delivered system is dedicated for layer-by-layer growth and thus enables preparation of high quality thin films and structuring on nanoscopic level. The system is equipped with several major components. For ablation of target material KrF excimer laser is used with energy up to 700 mJ per pulse and max. repetition rate of 50 Hz. For laser-energy setting and diagnostics attenuator and corresponding camera are used, respectively.
Access of equipment
Responsible for equipment: PhD Matjaž Spreitzer
first access upon agreement with responsible person, experienced operators through reservation system
Organisations (1)
no. Code Research organisation City Registration number No. of publications
1.  3050  Center of excellence on nanoscience and nanotechnology - Nanocenter, Ljubljana  Ljubljana  3666255000  1,935 
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