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Equipment source: ARIS

Power supply for high impulse power magnetron sputtering

Purpose of equipment
The power supply is operational in line with a vacuum system and magnetron source (cathode). It provides short pulses (10-1000 µs) at high peak power which allows for a complete ionization of the sputtered target atoms.
Access of equipment
Research projects (2) Legend
no. Code Title Period Head No. of publicationsNo. of publications
1.  J2-2513  Controllable broadband electromagnetic-radiation shielding  9/1/2020 - 8/31/2024  PhD Matej Pregelj  1,189 
2.  J2-2509  Self-organization of plasma in magnetron sputtering discharges  9/1/2020 - 2/29/2024  PhD Matjaž Panjan  3,306 
ARIS research and infrastructure programmes (1) Legend
no. Code Title Period Head No. of publicationsNo. of publications
1.  P2-0082  Thin-film structures and plasma surface engineering  1/1/2015 - 12/31/2021  PhD Miran Mozetič  4,657 
Organisations (1)
no. Code Research organisation City Registration number No. of publicationsNo. of publications
1.  0106  Jožef Stefan Institute  Ljubljana  5051606000  90,768 
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