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Equipment source: ARIS

Atomic layer deposition system

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Purpose of equipment
Atomic deposition system is intended for the application of different atomic layers. Since one of the goals in CENN Nanocenter is to test number of new nanomaterials and their potential use in industry, the Atomic deposition system will accelerate significantly the final prototyping. At the same time it will allow the functionalization of nanomaterials and thin nanostructured layers and similar systems constructed in advance with other methods. Such systems are extremely interesting as they allow easy production of sub-nanometer components, which have recently been the subject of great interest both in research as well as in industrial circles. Atomic deposition system is in use for a long time, today is also used in developing and manufacturing advanced nano-electronics on silicon base.
Access of equipment
Responsible for equipment: PhD Martin Strojnik
URL: www.nanocenter.si
first access upon agreement with responsible person, experienced operators through reservation system
Organisations (1)
no. Code Research organisation City Registration number No. of publications
1.  3050  Center of excellence on nanoscience and nanotechnology - Nanocenter, Ljubljana  Ljubljana  3666255  1,765 
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