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Projects / Programmes source: ARIS

Electron beam plotter for nanolithography

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Research activity

Code Science Field Subfield
2.09.00  Engineering sciences and technologies  Electronic components and technologies   

Code Science Field
P180  Natural sciences and mathematics  Metrology, physical instrumentation 
T171  Technological sciences  Microelectronics 
Keywords
electron beam plotter, nanolithography, nanoemitter, cold electron source,
Evaluation (rules)
source: COBISS
Evaluation of bibliographic research performance indicators according to ARIS methodology
Citations Citations for bibliographic records in COBIB.SI that are linked to records in citation databases
source: WoS source: Scopus source: COBISS
Researchers (4)
no. Code Name and surname Research area Role Period No. of publications
1.  03066  PhD Vincenc Nemanič  Electronic components and technologies  Head  2005 - 2008  245 
2.  23624  Matjaž Ptičar  Mechanical design  Researcher  2005 - 2008  0 
3.  20335  PhD Bojan Zajec  Civil engineering  Researcher  2005 - 2008  182 
4.  03366  Marko Žumer  Electronic components and technologies  Researcher  2005 - 2008  110 
Organisations (2)
no. Code Research organisation City Registration number No. of publications
1.  0106  Jožef Stefan Institute  Ljubljana  5051606000  90,753 
2.  7741  LPKF LASER & ELECTRONICS d.o.o. (Slovene)  Naklo  5711096  314 
Abstract
The idea of the electron-optical plotter for nanolithography is based on until now demonstrated benefits of a nano-emitter, used as a point-electron source. The information of the current strength on the target site is recorded by the chemical reaction, provoked by electrons hitting the target or in the polymer resist. The idea is furthermore based on miniaturization of the electron-optical system which enables the plotter to be operable in the 1 kV range. In such a way the depth of the path is substantially reduced and indirectly also the widening which limits the resolution of today's devices operating with electrons with energies 30 keV or higher.
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