The present invention relates to vertically oriented carbon nanostructured materials and to methods for forming vertically oriented carbon nanostructured materials (CNWs) by using non-equilibrium gases such as gaseous plasma. Methods are disclosed for rapid deposition of uniformly distributed nanowalls on large surfaces of substrates using ablation of bulk carbon materials by reactive gaseous species, formation of oxidized carbon-containing gaseous molecules, ionization of said molecules and interacting said molecules, neutral or positively charged, with a substrate. The CNWs prepared are useful in different applications such as fuel cells, lithium ion batteries, photovoltaic devices and sensors of specific gaseous molecules.
F.32 International patent
COBISS.SI-ID: 32999719At this world conference on Plasma Physics, we had an invited talk, where we reported the possible use of gaseous plasma for various industrial applications. We also presented the possibility of the CNW synthesis on the industrial level.
B.04 Guest lecture
COBISS.SI-ID: 32650791