Electrochemical experiments undoubtedly showed that BTAH and ATA are much more effective inhibitors of corrosion for copper in chloride media than BTAOH, despite the fact that BTAH and BTAOH display very similar molecular electronic properties that are usually associated with the corrosion inhibition ability. We argued that, in general, these are insufficient, thus emphasizing the importance of a rigorous modeling of interactions between the components of corrosion system. Such a modelling unabled us to pinpoint the principle factors that determine the corrosion inhibition characteristics.
By means of a detailed reconstruction of X-ray-induced Auger Cu L3M4,5M4,5 spectra of Cu sample immersed into BTAH inhibited and non-inhibited 3% NaCl solution we were able to estimate the thickness of the Cu2O oxide layer. The results show that the presence of BTAH substantially reduces the thickness of the Cu2O oxide layer formed on Cu in chloride media. The average thickness of the Cu2O layer below the inhibitor layer is estimated to be 1.3 nm, whereas the Cu2O thickness of the noninhibited sample is 2.2 nm.