L2-2100 — Annual report 2010
1.
Growth defects in PVD hard coatings

c) We have studied the mechanism of growth defect formation in thin films for several years. In 2010 we concentrated on the correlation between the defect density and corrosion resistance of hard coatings. For this purpose, selected coatings were exposed to a corrosion medium. The surface was analyzed both before and after corrosion treatment, in order to figure out which spots suffered localized corrosion attach. Selected spots were analyzed using focused ion beam, which enables an insight into the internal structure of the defect.

COBISS.SI-ID: 22830887
2.
The use of camera obscura in sputter deposition

The camera obscura was used to study sputtering from different two-element segmental targets: Ti–Al, Al–W, Al–Cu, Ti–W, Ni–C. The thickness profiles of deposits were measured by profilometer. A similar experiment was performed in a sputter deposition system. A shield with small aperture (1 mm in diameter) was positioned between the target and the glass substrate. Only the material sputtered in direction of the aperture was deposited on the substrate. In this way a direct image of the target was recorded (similar to a camera obscura).

COBISS.SI-ID: 22831143